Application of imaging ellipsometry and white light interference microscopy for detection of defects in epitaxially grown 4H–SiC layers
Ermilova E., Weise M., Hertwig A.Imaging ellipsometry, White light interference microscopy, 4H–SiC, Defects
| Document type | Article |
| Journal title / Source | Journal of the European Optical Society-Rapid Publications |
| Volume | 19 |
| Issue | 1 |
| Page numbers / Article number | 23 |
| Publisher's name | EDP Sciences |
| Publisher's address (city only) | Les Ulis cedex A, France |
| Publication date | 2023 |
| ISSN | 1990-2573 |
| DOI | 10.1051/jeos/2023018 |
| Language | English |